High Current PFIB Service Lab

High Current PFIB Service Lab

For applications requiring large milled volumes, or samples containing micrometer scale structures or low sputter rate materials, utilization of high current, xenon focused ion beam technology will significantly speed the time required to perform cross sectioning or micro machining. Our Xe Plasma FIB delivers the fastest ion beam milling rates, while maintaining the precision and beam placement accuracy inherent with conventional focused ion beams.

PFIB Service Lab

The Oregon Physics FIB Service laboratory operates their own, proprietary plasma FIB source on their dual Ga LMIS/plasma FIB and single beam plasma FIB instruments. Our applications specialists are prepared to help you increase your research throughput with fast turnaround for applications such as:

  • Rapid milling of large area cross sections for material studies, failure analysis and fabrication process studies.
  • Rapid micro-machining for prototyping or low volume manufacturing of structures in a variety of materials.

For over 25 years, the team at Oregon Physics has been involved with the science and development of plasma focused ion beam technology. They've long known the benefits of utilizing inert ions, and have extensive experience applying plasma FIB to both electronics and materials research.

Examining an aperture strip

In addition to our Xe plasma and gallium FIB systems, our contract lab is also equipped with an FEI NanoSEM with EDS for scanning electron microscope imaging and compositional analysis requests.

Contact us to discuss your high current FIB or SEM applications needs or request a quotation.


A 200µm long ‘T’ structure has been machined with our Hyperion FIB, for subsequent tensile strength testing. The machining time for a Ga+ FIB would be approximately 4 hours with a 40nA beam. However, with equal milling resolution, we have machined this in just 20 minutes with a 300nA Xe+ beam.

A custom, small area infra-red diffraction grating machined in silicon with our Xe+ plasma FIB, to avoid gallium implantation. Each 4µm wide groove takes ~15minutes to machine to a length of 150µm, with a 5nA Xe+ beam.

Plasma sprayed molybdenum coating on aluminum alloy substrate. Cross-sectional analysis reveals 3-5µm thick layers of columnar grains, along with some inter-layer voids. Our Hyperion FIB has been used to prepare a 300µm long cross-section, through a 300µm thick layer of molybdenum.

Characterization of Coatings with Ion and Electrons
Lucille A. Giannuzzi, Noel S. Smith and Sanjay Sampath, Microscopy and Microanalysis, 19 (Suppl 2), p1862, 2013.

Cross-sectioned ‘Through Silicon Vias’ (TSV’s), for studying the copper electro-deposition process in high aspect ratio vias. The cross-sections are 100µm wide, through a row of 5µm x 50µm vias. Plasma FIB machining time is 45-60 minutes for each cross-section.

Oregon Physics

15236 NW Greenbrier Parkway
Beaverton, OR 97006 USA

Phone: 503.601.0041
Fax: 503-992-6710


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